PHOTOELASTIC ANALYSIS OF STRESS DISTRIBUTION IN SINGLE TOOTH PLATFORM SWITCHED IMPLANT ABUTMENTS.
Dr. Arvind I. Moldi*, Dr. Karishma Mayer Chauhan, Dr. Amol Sangewar, Dr. Swati Devani, Dr. Mahantesh Achanur and Dr. Priyanka Konig
Statement of problem: Peri-implant crestal bone levels are critical to the success of implant therapy. This bone loss can be minimized by using abutments that are undersized compared to the diameter of implant. However the amount of stress transferred in such situations is not studied extensively. Purpose: The aim of this study was to evaluate, by photoelastic analysis, the stress distribution in the cervical and apical site of platform matched and platform switched implant abutments. Material and methods: 6 photoelastic models of implants were fabricated and divided into two groups of Group A (platform matched and B (platform switched). The models were kept in a circular polariscope and Axial and Oblique loads were applied of 10Kg (100N) and the stress patterns were assessed qualitatively and quantitatively. Results: The values of stress around group B models were significantly less than Group A. Conclusion: Platform switching concept reduces cervical area stress concentrations around implants and hence reduces bone loss.
Keywords: Dental implants, biomechanics, platform switching, photoelastic stress analysis.
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